OSEQUE CYBER SHINE Oxygen Mask Cleanser by is a Other medication manufactured, distributed, or labeled by SONGHAK CO., LTD.. Drug facts, warnings, and ingredients follow.
Inactive Ingredients: Water, Ammonium Lauryl Sulfate, Acrylates Copolymer, Cocamidopropyl Betaine, PEG-8, Cocamide DEA, Methyl Perfluorobutyl Ether, Methyl Perfluoroisobutyl Ether, PEG-7 Glyceryl Cocoate, Triethanolamine, Lithium Magnesium, Sodium Silicate, Trehalose, Lactose, Microcrystalline Cellulose, Sucrose, Zea Mays (Corn) Starch, Silk Powder, Emu Oil
Direction:
Step 1. Spread evenly a proper amount on the waterless face (pump 5-6 times). Surely, in order to create sufficient bubbles, use it with dry hands
Step 2. Wait for oxygen bubble what generates bubble itself
Step 3. Do not rub strongly but massage gently with fingers for better cleansing
Step 4. Wash off with lukewarm water
OSEQUE CYBER SHINE OXYGEN MASK CLEANSER
niacinamide glycerin disodium edta iron oxides cream |
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Labeler - SONGHAK CO., LTD. (688237512) |
Registrant - SONGHAK CO., LTD. (688237512) |
Establishment | |||
Name | Address | ID/FEI | Business Operations |
---|---|---|---|
SONGHAK CO., LTD. | 688237512 | manufacture(59370-100) |